The thin film and microfabrication laboratory is specialized in the deposition and analysis of thin films, as well as in the microfabrication of structures through UV photolithography and chemical etching processes.
Thin film deposition is primarily carried out using PVD (sputtering and evaporation). The films can be composed of metals (Cr, Ni, Al, etc.) or oxides (PZT, SiO₂, IZO, etc.), with thickness uniformity that can be below 5% on surfaces up to 4''. Some materials can be epitaxially deposited on suitable substrates.
The laboratory is equipped with a Heidelberg µMLA maskless aligner capable of performing grayscale UV photolithography, shaping photosensitive resins across 256 levels, which for example allows for the creation of diffractive optical elements.
Head of laboratory